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Hatem, F, Chai, Z, Zhang, WD, Fantini, A, Degraeve, R, Clima, S, Garbin, D, Robertson, J, Guo, Y, Zhang, JF, Marsland, J, Freitas, P, Goux, L and Kar, G (2019) Endurance improvement of more than five orders in GexSe1-x OTS selectors by using a novel refreshing program scheme. In: 2019 IEEE International Electron Devices Meeting (IEDM) . (IEEE International Electron Device Meeting (IEDM), 09 December 2019 - 11 December 2019, San Francisco).
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Abstract
Selector device is critical in high-density cross-point resistive switching memory arrays for suppressing the sneak leakage current path. GexSe1-x based ovonic threshold switch (OTS) selectors have recently demonstrated strong performance with high on-state current, nonlinearity and endurance. Detailed study of its reliability is still lacking and the understanding on the responsible mechanisms is limited. In this work, for the first time, the endurance degradation mechanism of Ge-rich GexSe1-x OTS is identified. Accumulation of slow defects that remain delocalized at off-state and GeSe segregation/crystallization during cycling lead to the recoverable and non-recoverable leakage current, respectively. Most importantly, a refreshing program scheme is developed to recover and prevent the OTS degradation and the endurance can be therefore improved by more than five orders without adding additional material elements or process steps.
| Item Type: | Conference or Workshop Item (Paper) |
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| Additional Information: | © 2019 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works. |
| Subjects: | T Technology > TK Electrical engineering. Electronics. Nuclear engineering |
| Divisions: | Electronics & Electrical Engineering (merged with Engineering 10 Aug 20) |
| Publisher: | IEEE |
| Date Deposited: | 11 Oct 2019 09:37 |
| Last Modified: | 24 May 2024 14:22 |
| DOI or ID number: | 10.1109/IEDM19573.2019.8993448 |
| URI: | https://researchonline.ljmu.ac.uk/id/eprint/11542 |
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